Equipment and Module
Equipment and Module
Intertec Taiwan Corp has been started operation on 2001 and specializes in the buying and selling used equipment including Semiconductor, III-V compounds, LED, Diode, MEMS and TFT-LCD Industrial. We are selling high quality refurbished wafer process equipment including stepper, Track and CDSEM…etc. Our Service Technical team has multiple years of experience in modification, retrofit, customized design, trouble shooting and installation. We can delivery win-win solution to our customer to meet requirement and target.
| No | Category | Tool Name | Maker | Model | Size | Vintage | REMARKS | |
|---|---|---|---|---|---|---|---|---|
| F1 | LITHOGRAPHY | ALIGNER | CANON | MPA600FA | 6 | |||
| F2 | LITHOGRAPHY | ALIGNER | CANON | MPA600FA | 1985 | |||
| F3 | LITHOGRAPHY | ALIGNER | CANON | PLA501F | ||||
| F4 | LITHOGRAPHY | ALIGNER | CANON | PLA501F | ||||
| F5 | LITHOGRAPHY | ALIGNER | CANON | PLA501F | 4 | |||
| F6 | LITHOGRAPHY | ALIGNER | CANON | PLA501F | 4 | |||
| F7 | LITHOGRAPHY | ALIGNER | CANON | PLA501FA | 3 | |||
| F8 | LITHOGRAPHY | ALIGNER | CANON | PLA521 | 3 | DEEP UV （Manual） | ||
| F9 | LITHOGRAPHY | ALIGNER | CANON | PLA521 | 4 | |||
| F10 | LITHOGRAPHY | MASK_ALIGNER | EVG | EVG6200 | 6 | 2006 | ||
| F11 | LITHOGRAPHY | STEPPER | CANON | FPA-3000 iw | 8 | 1997 | ||
| New | F12 | LITHOGRAPHY | STEPPER | NIKON | EX14 | 8 | DUV 248nm KRF | |
| New | F13 | LITHOGRAPHY | STEPPER | NIKON | EX14 | 8 | DUV 248nm KRF | |
| New | F14 | LITHOGRAPHY | STEPPER | NIKON | EX14 | 8 | DUV 248nm KRF | |
| F15 | LITHOGRAPHY | STEPPER | NIKON | NES-h04 | 2～6 | 2011 | ||
| New | F16 | LITHOGRAPHY | STEPPER | NIKON | NSR-1755i7B | 6 | I-Line 365nm | |
| New | F17 | LITHOGRAPHY | STEPPER | NIKON | NSR-2005I9C | 6 | I-Line 365nm | |
| F18 | LITHOGRAPHY | STEPPER | NIKON | NSR-2005i10C | 2 | wafer size available 2~8" | ||
| F19 | LITHOGRAPHY | EXPOSURE | ORC | EXF-2828-A-01 | 6 | |||
| F20 | LITHOGRAPHY | EXPOSURE | UNION | PEM-1000 | 4 | |||
| F21 | LITHOGRAPHY | SOG_COATER | DNS | SC-W80A-AG | 8 | |||
| F22 | LITHOGRAPHY | COATER | DNS | SCW-60A-AV | 6 | |||
| F23 | LITHOGRAPHY | COATER | TEL | MARK V | 5 | 1991 | COLOR RESIST | |
| F24 | LITHOGRAPHY | COATER | TEL | MARK 8 | 8 | |||
| F25 | LITHOGRAPHY | POLYIMIDE_COATER | ASAP | PTCA234-900-07-02 | 2,3,4 | 2008 | ||
| F26 | LITHOGRAPHY | SPIN_COATER | KYOUEI | 1H-Ⅲ | ||||
| F27 | LITHOGRAPHY | COATER_DEVELOPER | CANON | CDS630R | 6 | |||
| F28 | LITHOGRAPHY | COATER_DEVELOPER | DNS | SK-W636-BVP | 6 | 2001 | ||
| F29 | LITHOGRAPHY | DEVELOPER | DNS | SDW-60A-AVP | 6 | |||
| F30 | LITHOGRAPHY | DEVELOPER | KANAMEX | KD-200NP1 | 6 | Semi auto | ||
| F31 | LITHOGRAPHY | DEVELOPER | LITHOTEC | Lithotrac1008 | 6 | |||
| F32 | LITHOGRAPHY | DEVELOPER | TEL | MARK V | 5 | 1991 | COLOR RESIST | |
| F33 | LITHOGRAPHY | DEVELOPER | TEL | MARK 8 | 8 | |||
| F34 | LITHOGRAPHY | POLYIMIDE_DEVELOPER | DNS | SD-W80A-AVQ | 8 | |||
| F35 | LITHOGRAPHY | UV_CURE | USHIO | UMA-1002-HC93 | 8 | 1997 | ||
| F36 | LITHOGRAPHY | INK_JET_PRINTER | LITREX | 140P | Print area 370㎜ x 470mm | |||
| F37 | DIFFUSION | FURNACE | KOYO THERMO SYSTEM | VF-3000 | 4 | 2003 | 1050℃/MAX | |
| F38 | DIFFUSION | FURNACE | TEL | Alpha-8S | 8 | |||
| F39 | DIFFUSION | RTA | ULVAC | MILA-3000-P-N | 1□ | 2003 | 1200℃ | |
| F40 | DEPOSITION | APCVD | CANON | APT5800 | 8 | |||
| F41 | DEPOSITION | EVAPORATOR | EIKO | EO-5 | 30㎜□max | 2005 | ||
| F42 | DEPOSITION | SPUTTER | ANELVA | SPC-530H | ||||
| F43 | DEPOSITION | SPUTTER | ANELVA | SPC-530H | 5 | |||
| F44 | DEPOSITION | LPCVD | TEL | Alpha-8S | 8 | TEOS | ||
| F45 | DEPOSITION | LPCVD | TEL | Alpha-8S | 8 | Poly | ||
| F46 | ETCHER | DRY_ETCHER | CANON ANELVA | DEA506 | 6 | |||
| F47 | ETCHER | ETCHER | MIMASU | MSE-2000MD | 6 | 2002 | ||
| F48 | CLEAN | CMP_CLEANER | DNS | AS2000 | 8 | |||
| F49 | CLEAN | RINSER_DRYER | MICRO_ENGINEERING | SRD-180RN | 8 | |||
| F50 | CLEAN | RINSER_DRYER | SEMITOOL | 270F | 4 | |||
| F51 | CLEAN | RINSER_DRYER | SEMITOOL | SRD-240F | 3,4 | |||
| F52 | CLEAN | RINSER_DRYER | SEMITOOL | SRD-470S | 8 | 1995 | ||
| F53 | CLEAN | RINSER_DRYER | SEMITOOL | SRD-470S | ||||
| New | F54 | CLEAN | RINSER_DRYER | SEMITOOL | SRD-840F | 3、4 | ||
| F55 | CLEAN | SPIN_DRYER | CHOONPA_KOGYO | UJ-144-4E | ||||
| F56 | CLEAN | SPIN_DRYER | CHOONPA_KOGYO | UJ-144-4E | ||||
| F57 | CLEAN | SPIN_DRYER | DAITRON | SPD-160RN | 6 | 2009 | ||
| F58 | CLEAN | WAFER_CLEANER | RASCO | 3 | 2006 | |||
| F59 | METROLOGY | SEM | HITACHI | S-4700II | 2001 | FESEM, WORKING CONDITION | ||
| F60 | METROLOGY | SEM | HITACHI | S-9200S | 8 | VIPS | ||
| F61 | METROLOGY | SEM | HITACHI | S-9380 II | 12 | 2006 | FOUP | |
| F62 | METROLOGY | FESEM | JEOL | JSM-7401F | 2005 | |||
| F63 | METROLOGY | CONTAMINATION_CHECKER | TOPCON | WM-1500 | 8 | |||
| F64 | METROLOGY | ELLIPSOMETER | RUDOLPH | FE4 | 8 | 1995 | ||
| F65 | METROLOGY | FILM_THICKNESS_MEASUREMENT | KLA-TENCOR | FT750 | 8 | Missing Parts(Parts Machine) | ||
| F66 | METROLOGY | FILM_THICKNESS_MEASUREMENT | NANOMETRICS | 6100AT | 6 | 2005 | ||
| F67 | METROLOGY | FILM_THICKNESS_MEASUREMENT | YA-MAN | FILMTEK2000 | ||||
| F68 | METROLOGY | LAMBDA ACE | DNS | Lambda Ace VL-M8000-S | ||||
| F69 | METROLOGY | OVERLAY_MEASUREMENT | NANOMETRICS | METRA2100M | 6 | 1994 | Missing Parts(Parts Machine) | |
| F70 | METROLOGY | 3D_PROFILER | VEECO | WYCO NT3300 | ||||
| F71 | METROLOGY | PROFILER | KLA-TENCOR | P-2H | 6 | |||
| F72 | METROLOGY | SURFACE_PROFILER | TORAY | SP-700W8A | 8 | 2011 | ||
| F73 | METROLOGY | SURFACE_PROFILER | VECCO | NT8000 | ||||
| F74 | METROLOGY | CV_MEASUREMENT | FOUR DIMENSIONS | CV92A | 6 | |||
| F75 | METROLOGY | CONTAMINATION_CHECKER | KLA-TENCOR | SFS7600 | 8 | Missing Parts(Parts Machine) | ||
| B1 | ATE | TESTER | ADVANTEST | T7315 | ||||
| B2 | ATE | TESTER | AGILENT | 4071 | PARAMETRIC TESTER | |||
| B3 | ATE | TESTER | AGILENT | 84000 | 2003 | RF | ||
| B4 | ATE | TESTER | MOSAID | MS4205 | 2001 | MEMORY | ||
| B5 | ATE | TESTER | SPANDNIX | SX-2000 | 2006 | |||
| B6 | ATE | LOGIC_TESTER | YOKOGAWA | TS6000 | ||||
| B7 | ATE | LOGIC_TESTER | YOKOGAWA | TS6000 | ||||
| B8 | ATE | PROBER | ASTRO | 8 | 1995 | Manual, SHIELD BOX | ||
| B9 | ATE | PROBER | ASTRO | SE-6003 | 8 | 1995 | Manual, SHIELD BOX | |
| B10 | ATE | PROBER | LUFT | LP-6 | 6 | Manual | ||
| B11 | ATE | PROBER | OYAMA | OYM-420FL | 4 | Manual | ||
| B12 | ATE | PROBER | OYAMA | OYM-430 | Manual, SHIELD BOX | |||
| B13 | ATE | PROBER | TEL | P8XL | 8 | 2006 | CPU=VIP3 | |
| B14 | ATE | PROBER | VECTOR_SEMICONDUCTOR | VX3000T | 12 | 2008 | Manual,150℃,CCD camera | |
| B15 | ATE | PROBER HING | TSK | MHF300L | 1999 | For UF200S | ||
| B16 | ATE | PROBER HING | TSK | MHF300S | 1999 | For UF200A | ||
| B17 | ATE | PROBER PARTS | TSK | OCR CAMERA | For A-PM90A | |||
| B18 | ASSEMBLY | DICER | DISCO | DAD322 | 2014 | |||
| B19 | ASSEMBLY | DICER | DISCO | DFD641 | 8 | 2006 | UV | |
| B20 | ASSEMBLY | DICER | DISCO | DFD690 | 6 | 1996 | ||
| B21 | ASSEMBLY | DICER | DISCO | DFL7160 | 2011 | |||
| B22 | ASSEMBLY | DICER | TSK | A-WD-100A | 8 | 2000 | ||
| B23 | ASSEMBLY | DICER | TSK | A-WD-100A | 6 | 2005 | ||
| B24 | ASSEMBLY | DICER | TSK | A-WD-10A | 6 | 1998 | ||
| B25 | ASSEMBLY | DICER | TSK | A-WD-10B | 6 | 2008 |