Equipment and Module
Equipment and Module
Intertec Taiwan Corp has been started operation on 2001 and specializes in the buying and selling used equipment including Semiconductor, III-V compounds, LED, Diode, MEMS and TFT-LCD Industrial. We are selling high quality refurbished wafer process equipment including stepper, Track and CDSEM…etc. Our Service Technical team has multiple years of experience in modification, retrofit, customized design, trouble shooting and installation. We can delivery win-win solution to our customer to meet requirement and target.
| No | Category | Tool Name | Maker | Model | Size | Vintage | REMARKS | |
|---|---|---|---|---|---|---|---|---|
| F1 | LITHOGRAPHY | ALIGNER | CANON | MPA600FA | 6 | |||
| F2 | LITHOGRAPHY | ALIGNER | CANON | MPA600FA | 6 | |||
| F3 | LITHOGRAPHY | ALIGNER | CANON | PLA501F | ||||
| F4 | LITHOGRAPHY | ALIGNER | CANON | PLA501F | ||||
| F5 | LITHOGRAPHY | ALIGNER | CANON | PLA501F | 4 | |||
| F6 | LITHOGRAPHY | ALIGNER | CANON | PLA501F | 4 | |||
| F7 | LITHOGRAPHY | ALIGNER | CANON | PLA501FA | 5 | |||
| F8 | LITHOGRAPHY | ALIGNER | CANON | PLA501FA | 3 | |||
| F9 | LITHOGRAPHY | ALIGNER | CANON | PLA600F | 6 | |||
| F10 | LITHOGRAPHY | ALIGNER | CANON | PLA600FA | 4 | |||
| F11 | LITHOGRAPHY | ALIGNER | CANON | PLA600FA | 6 | |||
| F12 | LITHOGRAPHY | ALIGNER | CANON | MPA600FA | 4~6 | refurbish | ||
| F13 | LITHOGRAPHY | ALIGNER | EVG | 620 | 6 | 2008 | ||
| F14 | LITHOGRAPHY | MASK_ALIGNER | EVG | EVG6200 | 6 | 2006 | ||
| F15 | LITHOGRAPHY | SCANNER | NIKON | NSR-S204B | 8 | |||
| F16 | LITHOGRAPHY | SCANNER | NIKON | NSR-S306B | 8 | |||
| F17 | LITHOGRAPHY | STEPPER | CANON | FPA-3000 i5 | 4~8 | 1998 | refurbish | |
| F18 | LITHOGRAPHY | STEPPER | CANON | FPA-3000 iw | 8 | 1997 | ||
| F19 | LITHOGRAPHY | STEPPER | CANON | FPA-6000 ES6 | 12 | 2004 | ||
| F20 | LITHOGRAPHY | STEPPER | NIKON | EX14 | 8 | DUV 248nm KRF | ||
| F21 | LITHOGRAPHY | STEPPER | NIKON | EX14 | 8 | DUV 248nm KRF | ||
| F22 | LITHOGRAPHY | STEPPER | NIKON | EX14 | 8 | DUV 248nm KRF | ||
| F23 | LITHOGRAPHY | STEPPER | NIKON | NSR-2005i10C | 2 | wafer size available 2~8" | ||
| F24 | LITHOGRAPHY | STEPPER | NIKON | NSR-2205i12D | 8 | |||
| F25 | LITHOGRAPHY | COATER | SUSS | Gamma | 6 | |||
| F26 | LITHOGRAPHY | COATER | TEL | MARK8 | 8 | 2C | ||
| F27 | LITHOGRAPHY | COATER | EVG | 150 | 2005 | |||
| F28 | LITHOGRAPHY | SPIN_COATER | KYOUEI | 1H-Ⅲ | ||||
| F29 | LITHOGRAPHY | DEVELOPER | LITHOTEC | Lithotrac1008 | 6 | |||
| F30 | LITHOGRAPHY | DEVELOPER | TEL | MARK V | 5 | 2DEV | ||
| F31 | LITHOGRAPHY | DEVELOPER | TEL | MARK V | 5 | 1991 | color resist | |
| F32 | LITHOGRAPHY | DEVELOPER | TEL | MARK8 | 8 | 2C | ||
| F33 | LITHOGRAPHY | DEVELOPER | KANAMEX | KD-200NP1 | 6 | semi auto | ||
| New | F34 | LITHOGRAPHY | UV_CURE | USHIO | UMA-1002-HC93 | 8 | 1997 | |
| F35 | LITHOGRAPHY | COATER_DEVELOPER | CANON | CDS630R | 6 | |||
| F36 | LITHOGRAPHY | COATER_DEVELOPER | LITHOTEC | LSC800C | 5 | 1C1D | ||
| F37 | LITHOGRAPHY | INK_JET_PRINTER | LITREX | 140P | 6 | print area 370㎜ x 470mm | ||
| F38 | LITHOGRAPHY | EXPOSURE | ORC | EXF-2828-A-01 | 6 | |||
| F39 | DIFFUSION | RTA | ULVAC | MILA-3000-P-N | 1□ | 2003 | 1200℃,15mm | |
| New | F40 | DIFFUSION | FURNACE | KEM | KJ-853 | 8 | ||
| F41 | DIFFUSION | FURNACE | KOYO THERMO SYSTEM | KTF-773N | 1100℃ | |||
| F42 | DEPOSITION | EVAPORATOR | EIKO | EO-5 | 30㎜□max | 2005 | ||
| F43 | DEPOSITION | CVD | AMAT | CENTURA RTP XE+ | 8 | |||
| F44 | DEPOSITION | CVD | PlasmaTherm | Versaline | 6 | |||
| F45 | DEPOSITION | CVD | JPEL | VDS-5800N | 6 | |||
| F46 | DEPOSITION | SACVD | AMAT | Producer | 8 | 2005 | TEOS/SILANE | |
| F47 | DEPOSITION | LPCVD | KEM | DJ-802V | 6 | |||
| F48 | DEPOSITION | SPUTTER | AMAT | ENDURA | 6 | |||
| F49 | DEPOSITION | SPUTTER | ANELVA | SPC-530H | 6 | 2009 | ||
| F50 | DEPOSITION | SPUTTER | MRC | MARK4 | 8 | refurbish | ||
| F51 | DEPOSITION | EPITAXIAL | AMAT | CENTURA EPI | 6～8 | refurbish | ||
| F52 | DEPOSITION | EPITAXIAL | GEMINI | GEMINI III E | 6 | batch type | ||
| F53 | ETCHER | DRY_ETCHER | CANON ANELVA | DEA506 | 6 | 1986 | ||
| New | F54 | ETCHER | DRY_ETCHER | MATTSON | ASPEN III | 12 | ||
| F55 | ETCHER | DRY_ETCHER | PSC | DES-220-456AVL | ||||
| New | F56 | ETCHER | DRY_ETCHER | TEL | UNITY 2E 855DD | 8 | ||
| F57 | ETCHER | ETCHER | PLASMATHERM | VERSALINE | 6 | |||
| F58 | ETCHER | WET_SPRAY_ETCHER | SEMITOOL | SAT | 4~8 | refurbish | ||
| F59 | ETCHER | WET_SPRAY_ETCHER | SEMITOOL | SAT211 | 6 | GOLD | ||
| F60 | CLEAN | SPIN_DRYER | DAITRON | SPD-160RN | 6 | 2009 | 1 cassette | |
| F61 | CLEAN | SPIN_DRYER | CHOONPA_KOGYO | UJ-144-4E | ||||
| F62 | CLEAN | SPIN_DRYER | CHOONPA_KOGYO | UJ-144-4E | ||||
| F63 | CLEAN | SPIN_DRYER | KAIJO | KSD-116 | 6 | 1990 | 4 cassette | |
| F64 | CLEAN | RINSER_DRYER | SEMITOOL | SRD-240F | 3、4 | |||
| F65 | CLEAN | RINSER_DRYER | SEMITOOL | SRD-470S | 8 | 1995 | ||
| F66 | CLEAN | RINSER_DRYER | SEMITOOL | SRD-470S | 5 | |||
| F67 | CLEAN | RINSER_DRYER | SEMITOOL | SRD-840F | 3、4 | |||
| F68 | CLEAN | RINSER_DRYER | MICRO_ENGINEERING | SRD-180RN | 8 | |||
| F69 | CLEAN | SCRUBBER | DNS | SSW-60A-AR | 6 | (4B) | ||
| F70 | CLEAN | SCRUBBER | DNS | SSW-60A-AR | 6 | (1F/1B) | ||
| F71 | METROLOGY | SEM | HITACHI | RS4000 | 8 | |||
| F72 | METROLOGY | SEM | HITACHI | S-4700II | 2001 | FESEM, WORKING CONDITION | ||
| F73 | METROLOGY | SEM | HITACHI | S-4800 | 8 | 2008 | no EDX | |
| F74 | METROLOGY | SEM | HITACHI | S-6280 | 6 | Turb missing | ||
| F75 | METROLOGY | SEM | HITACHI | S-8820 | 4~8 | |||
| F76 | METROLOGY | SEM | HITACHI | S-9200S | 8 | VIPS | ||
| F77 | METROLOGY | SEM | HITACHI | S-9220 | 8 | 1997 | ||
| F78 | METROLOGY | SEM | HITACHI | S-9380 II | 12 | 2006 | FOUP | |
| F79 | METROLOGY | SEM | HITACHI | S-9360 | 8,12 | |||
| F80 | METROLOGY | SEM | HITACHI | S-8640 | 4~6 | 1997 | ||
| F81 | METROLOGY | SEM | HITACHI | S-9380 II | 12 | 2007 | 3Port | |
| F82 | METROLOGY | CONTAMINATION_CHECKER | KLA-TENCOR | SP1 Tbi | 8 | |||
| F83 | METROLOGY | CONTAMINATION_CHECKER | TOPCON | WM-1500 | 8 | |||
| F84 | METROLOGY | FILM_THICKNESS_MEASUREMENT | YA-MAN | FILMTEK2000 | 5 | |||
| F85 | METROLOGY | FILM_THICKNESS_MEASUREMENT | NANOMETRICS | 6100AT | 6 | 2005 | ||
| F86 | METROLOGY | FILM_THICKNESS_MEASUREMENT | THERMAWAVE | 5220I | ||||
| F87 | METROLOGY | CONTAMINATION_CHECKER | KLA-TENCOR | SFS6420 | 8 | |||
| F88 | METROLOGY | CONTAMINATION_CHECKER | KLA-TENCOR | SFS7600 | 8 | parts machine | ||
| F89 | METROLOGY | OVERLAY_MEASUREMENT | NANOMETRICS | METRA2100M | 6 | 1994 | parts machine | |
| F90 | METROLOGY | WAFER_INSPECTION | NIKON | Optistation 3A | 5 | |||
| F91 | METROLOGY | MICROSCOPE | OLYMPUS | BH2-UMA + AL1LMBL | 6 | |||
| F92 | METROLOGY | MICROSCOPE | OLYMPUS | Nikon SMZ-10 with AL100-LMB8 | 6 | |||
| F93 | METROLOGY | PROFILER | KLA-TENCOR | P-2H | 6 | Long scan profiler | ||
| F94 | METROLOGY | 3D_PROFILER | VEECO | WYCO NT8000 | 5 | 2004 | ||
| F95 | METROLOGY | 3D_PROFILER | VEECO | WYKO NT3300 | 5 | |||
| F96 | METROLOGY | CV_MEASUREMENT | FOUR DIMENSIONS | CV92A | 6 | |||
| F97 | METROLOGY | FIB | FEI | V600CE | refurbish | |||
| F98 | METROLOGY | DUAL_BEAM_MICROSCOPE | FEI | Altra855 | refurbish | |||
| B1 | ATE | TESTER | ADVANTEST | 5581H | memory tester | |||
| B2 | ATE | TESTER | ADVANTEST | T5761ES | 2008 | memory tester |