Turnkey

Nikon stepper NSR2205 i14

• Wafer size: 150mm or 200mm , Flat and notch wafers
• Resolution: 0.35um
• Focus Repeatability: within 0.08um (3σ)
• Distortion: Within+/-0.04um
• ORT: Within +/-0.1 sec
• Uniformity: less than <1.5%
• Intensity: More than 650 mw/cm²
• Reticle blind: 0.4mm~0.8mm (on reticle)
• Wafer flatness: Within 2.5um
• Stepping: 3σ within 0.03um

Nikon stepper NSR2205 i12

• Wafer size: 50mm,100mm ,150mm or 200mm , Flat and notch wafers
• Resolution: 0.35um
• Focus Repeatability: within 0.15um (3σ)
• Distortion: Within+/-0.04um
• ORT: Within +/-0.1 sec
• Uniformity: less than <1.5%
• Intensity: More than 600 mw/cm²
• Reticle blind: 0.4mm~0.8mm (on reticle)
• Wafer flatness: Within 2.5um
• Stepping: 3σ within 0.04um

Nikon stepper NSR2205 i11

• Wafer size: 50mm,100mm ,150mm or 200mm , Flat and notch wafers
• Resolution: 0.4um
• Focus Repeatability: within 0.15um (3σ)
• Distortion: Within+/-0.045um
• ORT: Within +/-0.1 sec
• Uniformity: less than <1.5%
• Intensity: More than 600 mw/cm²
• Reticle blind: 0.4mm~0.8mm (on reticle)
• Wafer flatness: Within 2.5um
• Stepping: 3σ within 0.05um

Nikon stepper NSR2005 i10

• Wafer size: 50mm,100mm ,150mm or 200mm , Flat and notch wafers
• Resolution: 0.45um
• Depth of focus: <0.6um
• Distortion: Within+/-0.6um
• ORT: Within +/-0.1 sec
• Uniformity: less than <1.5%
• Intensity: More than 550 mw/cm²
• Reticle blind: 0.4mm~0.8mm (on reticle)
• Wafer flatness: Within 2.5um
• Stepping: 3σ within 0.065um

Nikon stepper NSR2005 i9

• Wafer size: 50mm,100mm ,150mm or 200mm , Flat and notch wafers
• Resolution: 0.5um
• Depth of focus: <0.6um
• Distortion: Within+/-0.65um
• ORT: Within +/-0.15 sec
• Uniformity: less than <1.5%
• Intensity: More than 500 mw/cm²
• Reticle blind: 0.4mm~0.8mm (on reticle)
• Wafer flatness: Within 2.5um
• Stepping: 3σ within 0.065um

Nikon stepper NSR2005 i8

• Wafer size: 50mm,100mm ,150mm or 200mm , Flat and notch wafers
• Resolution: 0.5um (8 inch wafer)
• Depth of focus: <0.6um
• Distortion: Within+/-0.07um
• ORT: Within +/-0.2 sec
• Uniformity: less than <2%
• Intensity: More than 500 mw/cm²
• Pre-alignment accuracy: 3sigma<5um
• Wafer flatness: within +/-1.5sec
• Stepping: 3σ within 0.07um

Nikon stepper NSR1755 i7

• Wafer size: 50mm,100mm ,150mm or 200mm , Flat and notch wafers
• Resolution: 0.55um (8 inch wafer)
• Depth of focus: <0.6um
• Distortion: Within+/-0.08um
• Astigmatism: less than 2.0 μm
• Uniformity: less than <2%
• Intensity: More than 500 mw/cm²
• Pre-alignment accuracy: 3sigma<5um
• Chip leveling (accuracy): within +/-1.5sec
• Stepping: 3σ within 0.08um