Turnkey

Nikon stepper NSR2205 i14

Nikon stepper NSR2205 i14

  • Wafer size: 150mm or 200mm , Flat and notch wafers
  • Resolution: 0.35um
  • Focus Repeatability: within 0.08um (3σ)
  • Distortion: Within+/-0.04um
  • ORT: Within +/-0.1 sec
  • Uniformity: less than <1.5%
  • Intensity: More than 650 mw/cm2
  • Reticle blind: 0.4mm~0.8mm (on reticle)
  • Wafer flatness: Within 2.5um
  • Stepping: 3σ within 0.03um
Nikon stepper NSR2205 i12

Nikon stepper NSR2205 i12

  • Wafer size: 50mm,100mm ,150mm or 200mm , Flat and notch wafers
  • Resolution: 0.35um
  • Focus Repeatability: within 0.15um (3σ)
  • Distortion: Within+/-0.04um
  • ORT: Within +/-0.1 sec
  • Uniformity: less than <1.5%
  • Intensity: More than 600 mw/cm2
  • Reticle blind: 0.4mm~0.8mm (on reticle)
  • Wafer flatness: Within 2.5um
  • Stepping: 3σ within 0.04um
Nikon stepper NSR2205 i11

Nikon stepper NSR2205 i11

  • Wafer size: 50mm,100mm ,150mm or 200mm , Flat and notch wafers
  • Resolution: 0.4um
  • Focus Repeatability: within 0.15um (3σ)
  • Distortion: Within+/-0.045um
  • ORT: Within +/-0.1 sec
  • Uniformity: less than <1.5%
  • Intensity: More than 600 mw/cm2
  • Reticle blind: 0.4mm~0.8mm (on reticle)
  • Wafer flatness: Within 2.5um
  • Stepping: 3σ within 0.05um
Nikon stepper NSR2005 i10

Nikon stepper NSR2005 i10

  • Wafer size: 50mm,100mm ,150mm or 200mm , Flat and notch wafers
  • Resolution: 0.45um
  • Depth of focus: <0.6um
  • Distortion: Within+/-0.6um
  • ORT: Within +/-0.1 sec
  • Uniformity: less than <1.5%
  • Intensity: More than 550 mw/cm2
  • Reticle blind: 0.4mm~0.8mm (on reticle)
  • Wafer flatness: Within 2.5um
  • Stepping: 3σ within 0.065um
Nikon stepper NSR2005 i9

Nikon stepper NSR2005 i9

  • Wafer size: 50mm,100mm ,150mm or 200mm , Flat and notch wafers
  • Resolution: 0.5um
  • Depth of focus: <0.6um
  • Distortion: Within+/-0.65um
  • ORT: Within +/-0.15 sec
  • Uniformity: less than <1.5%
  • Intensity: More than 500 mw/cm2
  • Reticle blind: 0.4mm~0.8mm (on reticle)
  • Wafer flatness: Within 2.5um
  • Stepping: 3σ within 0.065um
Nikon stepper NSR2005 i8

Nikon stepper NSR2005 i8

  • Wafer size: 50mm,100mm ,150mm or 200mm , Flat and notch wafers
  • Resolution: 0.5um (8 inch wafer)
  • Depth of focus: <0.6um
  • Distortion: Within+/-0.07um
  • ORT: Within +/-0.2 sec
  • Uniformity: less than <2%
  • Intensity: More than 500 mw/cm2
  • Pre-alignment accuracy: 3sigma<5um
  • Wafer flatness: within +/-1.5sec
  • Stepping: 3σ within 0.07um
Nikon stepper NSR1755 i7

Nikon stepper NSR1755 i7

  • Wafer size: 50mm,100mm ,150mm or 200mm , Flat and notch wafers
  • Resolution: 0.55um (8 inch wafer)
  • Depth of focus: <0.6um
  • Distortion: Within+/-0.08um
  • Astigmatism: less than 2.0 μm
  • Uniformity: less than <2%
  • Intensity: More than 500 mw/cm2
  • Pre-alignment accuracy: 3sigma<5um
  • Chip leveling (accuracy): within +/-1.5sec
  • Stepping: 3σ within 0.08um